The Laurell WS-650-23 B spin coater is compact and packed with advanced features. This 650-series coater system will accommodate up to ø150mm wafers and 5" × 5" (127mm × 127mm) substrates, and features a maximum rotational speed of 12,000 RPM (based on a ø100mm silicon wafer).

Maximum substrate size: up to 100 x 100 mm substrates or 100 mm wafers, Split field optics

350 W mercury lamp, Hard or soft contact modes, Alignment optics consists of normal field microscope with objective turret for different magnifications.

Laboratory table top oven by cole parmer, model 05015-54, serial # 82-592. Features maximum temperature of 200 degrees Celsius, 12" x 12' x 18" internal dimensions with two shelves

Optical cleaner uses ultrasonic energy 55 KHz to get objects microscopically clean. Small and economical. Tank measures 6-1/2" length by 3-1/2" width by 2-1/4" depth; tank capacity: 15oz. Unit comes with cover and basket. The B200 meets FCC, CE and CSA standards.

An aligner is a system that produces integrated circuits (IC) using the photolithography process. It holds the photomask over the silicon wafer while a bright light is shone through the mask and onto the photoresist. The "alignment" refers to the ability to place the mask over precisely the same location repeatedly as the chip goes through multiple rounds of lithography.  

One of the first ergonomically friendly microscopes, the SMZ-U has a low eye-level design feature that reduces fatigue over long hours of observation. A variable iris diaphragm, conveniently positioned on the front of the body tube, offered flexible control for depth of focus,

The LCD display screen separator machine is designed with a clean and smooth aluminum board with uniform temperature dispersion, and features an overheating protection function up to 130℃. This separator machine is ideal equipment for the separation of screens for devices

Photolithography Laboratory