A new approach for performing full field imaging ellipsometry (FFIE) was developed, which uses a high numerical aperture microscope objective lens to illuminate a 2D object's surface. The light reflected from each point of the surface is gathered by the same lens and projected onto a 2D CCD detector array, thus enabling the measurement of numerous surface points simultaneously. Using this simple method, areas of up to 0.9 cm^2 can be measured with high accuracy. This technique can bring great benefits to the scientific community and nanotechnology engineers facing the need to analyze large thin film surfaces.